| 000 | 00884nam a22002414a 4500 | ||
|---|---|---|---|
| 999 |
_c28638 _d28638 |
||
| 005 | 20200311121016.0 | ||
| 008 | 090805s2006 ii a grm a000 u eng | | ||
| 040 | _aMAIN | ||
| 041 | 0 | _aEnglish | |
| 082 | 0 |
_a537.622 _bBER/S |
|
| 100 | 1 | _aBera, Milan Kumar | |
| 245 | 1 | 0 |
_aStudies on high-k gate dielectrics on strained-si for heterostructure MOSFET applications / _cresearched by Milan Kumar Bera; guided by Satyajit Saha and Chinmay K. Maiti. |
| 260 | 3 |
_aMidnapore : _bVidyasagar University, _c2006. |
|
| 300 |
_axviii,188p.+ 4 : _bfigs.,tables ; _c25cm |
||
| 500 | _aDocuments represents Ph.D Thesis | ||
| 653 | 0 | 0 | _aSEMICONDUCTORS |
| 653 | 0 | 0 | _aDIELECTRICS |
| 653 | 0 | _aMETAL-OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR (MOSFTE) | |
| 700 | 1 | _aSaha, Satyajit | |
| 700 | 1 | _aMaiti, Chinmay K. | |
| 710 | 2 |
_aVidyasagar University. _bDepartment of Physics. |
|
| 942 | _cTH | ||