Studies on high-k gate dielectrics on strained-si for heterostructure MOSFET applications /
researched by Milan Kumar Bera; guided by Satyajit Saha and Chinmay K. Maiti.
- Midnapore : Vidyasagar University, 2006.
- xviii,188p.+ 4 : figs.,tables ; 25cm
Documents represents Ph.D Thesis
SEMICONDUCTORS DIELECTRICS METAL-OXIDE SEMICONDUCTOR FIELD EFFECT TRANSISTOR (MOSFTE)